SI-H100 Semiconductor Gas Detector: Solving False Alarm Challenges in Semiconductor Manufacturing 

In semiconductor manufacturing, gases like NF3 (Nitrogen Trifluoride) and COS (Carbonyl Sulfide) are critical to monitor for safety and process optimization. However, both gases often cause false alarms in traditional gas detection methods due to interference from other substances used in the semiconductor process. 

Challenges in Gas Detection: 

• NF3 Detection: To detect NF3, a pyrolyzer is used to decompose the gas before detection by an electrochemical sensor. Unfortunately, this process also breaks down other interference gases, which leads to false alarms. 

• COS Detection: COS requires detection at very low alarm concentrations, but electrochemical sensors can react with common substances like IPA (Isopropyl Alcohol) and alcohols, which are frequently used in cleaning semiconductor equipment, causing unwanted false alarms. 

SENKO's Solution: SENKO has developed advanced NDIR (Non-Dispersive Infrared) NF3 and NDIR COS sensors to address these interference-related issues. These sensors provide a more accurate, reliable detection method that minimizes the risk of false alarms caused by unwanted chemical reactions. By leveraging the NDIR technology, SENKO’s sensors detect the target gases without the complications of decomposing interference gases, thus ensuring precise and consistent operation. 

Key Benefits: 

1. Reduced False Alarms: NDIR sensors are less susceptible to interference from other chemicals used in semiconductor manufacturing processes. 

2. Accurate Detection: The NDIR technology allows for the direct measurement of NF3 and COS gases without the breakdown of other substances. 

3. Improved Reliability: With more precise detection, the SI-H100 provides greater reliability in critical semiconductor environments. 

SENKO's NDIR-based sensors are now integrated into the SI-H100 Semiconductor Gas Detector, offering semiconductor manufacturers a robust solution to enhance both safety and operational efficiency.